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OASIS.MASK

OASIS.MASK is a standardized language used by computers to represent and express the electronic pattern of an integrated circuit during the engineering, pattern generation and the inspection of semiconductor photomasks.

SEMI P44 OASIS.MASK (OASIS.MASK) is a constrained version of SEMI P39 OASIS (OASIS). This constrained version of OASIS emphasizes the data constructs, values and record types that streamline the OASIS reading and writing processes that are unique to the computer systems used in the semiconductor integrated circuit photomask manufacturing flow. The use of OASIS.MASK within the photomask manufacturing flow is optional. OASIS can be used as well.

All allowed OASIS record types have been categorized in OASIS.MASK as either Mandatory(M), Allowed(A), Ignored(I), Prohibited(X). Furthermore, the values assigned to each record type must be within a range of values established by the OASIS.MASK standard. OASIS.MASK specifies user-defined PROPERTY records that are not supported in OASIS as "standard" PROPERTY record types.